Coated monocrystalline silicon substrate wafer for infrared applications - Diameter 25-105 mm, thickness 0.5 mm (40 mm)
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Monocrystalline silicon substrate designed for infrared applications, ensuring optimal performance in IR windows and detectors. Available in a range of diameters from 25mm to 105mm, with a constant thickness of 0.5mm for versatile use in various optical systems. Exceptional dimensional tolerance of +/-0.02mm, ensuring accuracy and reliability for critical optical applications. Higher brightness index of 20/10 or better, ensuring high light transmission and minimal distortion for enhanced imaging. Customizable coatings are available, including AR and BBAR, to meet the specific needs of IR cameras, thermal imagers and spectrometers.
Description
(1)
Monocrystalline silicon substrate designed for infrared applications, ensuring optimal performance in IR windows and detectors. Available in a range of diameters from 25mm to 105mm, with a constant thickness of 0.5mm for versatile use in various optical systems. Exceptional dimensional tolerance of +/-0.02mm, ensuring accuracy and reliability for critical optical applications. Higher brightness index of 20/10 or better, ensuring high light transmission and minimal distortion for enhanced imaging. Customizable coatings are available, including AR and BBAR, to meet the specific needs of IR cameras, thermal imagers and spectrometers.
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