€ 50.72
Coated monocrystalline silicon substrate wafer for infrared applications - Diameter 25-105 mm, thickness 0.5 mm (25 mm)
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Monocrystalline silicon substrate designed for infrared applications, ensuring optimal performance in IR windows and detectors. Available in a range of diameters from 25mm to 105mm, with a constant thickness of 0.5mm for versatile use in various optical systems. Exceptional dimensional tolerance of +/-0.02mm, ensuring accuracy and reliability for critical optical applications. Higher brightness index of 20/10 or better, ensuring high light transmission and minimal distortion for enhanced imaging. Customizable coatings are available, including AR and BBAR, to meet the specific needs of IR cameras, thermal imagers and spectrometers.
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Monocrystalline silicon substrate designed for infrared applications, ensuring optimal performance in IR windows and detectors. Available in a range of diameters from 25mm to 105mm, with a constant thickness of 0.5mm for versatile use in various optical systems. Exceptional dimensional tolerance of +/-0.02mm, ensuring accuracy and reliability for critical optical applications. Higher brightness index of 20/10 or better, ensuring high light transmission and minimal distortion for enhanced imaging. Customizable coatings are available, including AR and BBAR, to meet the specific needs of IR cameras, thermal imagers and spectrometers.
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