Coated Monocrystalline Silicon Substrate Wafer for Infrared Applications - 25-105mm Diameter, 0.5mm Thickness (40mm)
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Description
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High-quality monocrystalline silicon substrate wafers designed for infrared applications and ensure optimal performance in IR windows and detectors. Available in diameters from 25 mm to 105 mm with a uniform thickness of 0.5 mm, perfect for various optical setups. Exceptional dimensional tolerance of +/-0.02 mm, which guarantees precision and reliability for your optical needs. High brightness rating of 20/10 or better, which improves image sharpness and performance in thermal imaging and IR spectrometry. Customizable coatings are available, including AR and BBAR to meet specific application requirements for improved light transmission.
Description
(1)
High-quality monocrystalline silicon substrate wafers designed for infrared applications and ensure optimal performance in IR windows and detectors. Available in diameters from 25 mm to 105 mm with a uniform thickness of 0.5 mm, perfect for various optical setups. Exceptional dimensional tolerance of +/-0.02 mm, which guarantees precision and reliability for your optical needs. High brightness rating of 20/10 or better, which improves image sharpness and performance in thermal imaging and IR spectrometry. Customizable coatings are available, including AR and BBAR to meet specific application requirements for improved light transmission.
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