Monocrystalline silicon wafer specially designed for infrared applications, ensuring optimal functionality in IR detectors and cameras. Versatile size range from 25mm to 105mm with a uniform thickness of 0.5mm, suitable for various optical configurations and configurations. Exceptional dimensional tolerance of +/-0.02mm ensures accuracy for critical optical engineering tasks and applications. Features λ/10 face shape and +/-30'' parallelism, providing superior optical clarity and alignment for advanced imaging systems. Custom coating options, including AR and BBAR, improve light transmission and minimize reflections, tailored to meet your specific optical requirements.
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