Reactive-ion Etching: Microfabrication, Plasma, Wafer

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Reactive-ion Etching: Microfabrication, Plasma, Wafer

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€ 127.10

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Reactive-ion Etching: Microfabrication, Plasma, Wafer

Product specifications

Brand OmniScriptum
EAN
  • 9786131020001

OmniScriptum

Etching (Microfabrication): Microfabrication, Wafer (electronics), Photoresist, Photolithography, Silicon nitride, Undercut (manufacturing), Isotropy

€ 127.10
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OmniScriptum

Dry etching: Semiconductor, Fluorocarbon, Boron trichloride, Isotropic etching, Photolithography, Semiconductor device, Plasma...

€ 127.10
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OmniScriptum

Black silicon: Semiconductor material, Eric Mazur, Reactive ion etching, Infrared, Thermal imaging...

€ 127.10
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OmniScriptum

Radical Ion: Organic Chemistry, Reactive Intermediates

€ 127.10
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