APO Flat Field Full Complex Achromatic Objective 2X 5X 10X 20X 50X(2x)
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Versatile APO objective lens with magnifications of 2X, 5X, 10X, 20X, and 50X, perfect for various microscopy applications. devised for flat field apochromatic imaging, ensuring high-resolution and color fidelity in optical path construction and machine machine setups. Features a numerical aperture range of 0.055 to 0.5, providing excellent light-gathering ability and image clarity across all magnifications. Ultra long working distances ranging from 18.9mm to 33.72mm, allowing for easy manipulation of samples without compromising . Ideal for use in electronic manufacturing, machine vision, and university research, supporting both micro and macro studies with precise depth of field measurements.
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Description
Amazon
Versatile APO objective lens with magnifications of 2X, 5X, 10X, 20X, and 50X, perfect for various microscopy applications. devised for flat field apochromatic imaging, ensuring high-resolution and color fidelity in optical path construction and machine machine setups. Features a numerical aperture range of 0.055 to 0.5, providing excellent light-gathering ability and image clarity across all magnifications. Ultra long working distances ranging from 18.9mm to 33.72mm, allowing for easy manipulation of samples without compromising . Ideal for use in electronic manufacturing, machine vision, and university research, supporting both micro and macro studies with precise depth of field measurements.
Description
(1)
Versatile APO objective lens with magnifications of 2X, 5X, 10X, 20X, and 50X, perfect for various microscopy applications. devised for flat field apochromatic imaging, ensuring high-resolution and color fidelity in optical path construction and machine machine setups. Features a numerical aperture range of 0.055 to 0.5, providing excellent light-gathering ability and image clarity across all magnifications. Ultra long working distances ranging from 18.9mm to 33.72mm, allowing for easy manipulation of samples without compromising . Ideal for use in electronic manufacturing, machine vision, and university research, supporting both micro and macro studies with precise depth of field measurements.
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